Women's UA Essential Studio Jacket- Under Armour Hong Kong
 

Product DNA

  • Fitted: Sits close to the skin for a streamlined fit without the squeeze of compression.
  • UA StudioLux fabric delivers relentless support with a super-soft luxurious feel.
  • Signature Moisture Transport System wicks sweat to keep you dry and light.
  • Lightweight, 4-Way Stretch construction improves mobility and maintains shape.
  • Anti-Odor technology keeps your gear fresher, longer.
  • Full zip front with modified low-profile stand collar.
  • Drop-tail hem offers superior back coverage.
  • Princess seams create a slimmer, more streamlined silhouette.
  • Hand pockets to stash your stuff.
  • Fabric: Polyester, Elastane.
  • Fit guidelines

Fit guidelines

Fit Guide:Fitted
  • Compression
  • Fitted
  • Loose

Fit guidelines

Fit Guide:Fitted
  • Compression
  • Fitted
  • Loose

Previously Viewed Items