Women's UA Studio Essential Jacket|Under Armour HK
 

Product DNA

  • UA StudioLux Lite fabric delivers a lightweight feel with a super-supportive fit.
  • Woven sleeves and neck for durability where you need it most.
  • Signature Moisture Transport System wicks sweat to keep you dry and light.
  • Lightweight, 4-Way Stretch construction improves mobility and maintains shape.
  • Generous ruched neck with hidden back cinch for adjustable fit.
  • Drop-tail hem offers superior back coverage.
  • Full zip front.
  • Open hand pockets.
  • Fabric: Body: Polyester, Elastane; Others: Polyester.
  • FeedbackReport
  • Fit guidelines

Fit guidelines

Fit Guide:Fitted
  • Compression
  • Fitted
  • Loose

FeedbackReport

Model
Height
Weight
Shoulder
Chest
Waist
Tryout Size
Feedback Experience
Gigi
162
52.5
38
82
68
S
Fitting
Candice
165
57
37
86
66
M
Fitting
Michelle
170
58
39
86
72
L
Fitting

Fit guidelines

Fit Guide:Fitted
  • Compression
  • Fitted
  • Loose

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